:: IPCI ::

My Courses:

Techonolgy of microelectronic devices

Substrate preparation

Film deposition
    Tutorials (6)
     Materials and material properties
     Physical Vapor Deposition
     Chemical Vapor Deposition
     Thermal growth
     Epitaxy
     Deposition and growth using liquid sources

Modifying the film properties

Fabricating devices

Chemical Vapor Deposition tutorial

Modules

1. Theory of gas kinetics
2. Plasma
3. Principle of Chemical Vapor Deposition
4. Types of CVD

pages: previous | 1 2 3 4 5 6 [7]

METAL CVD - selective deposition

"tungsten plug" process - Selective deposition of tungsten on Si and metals. The process takes place slowly or not at all on SiO₂
application: to fill the holes that make contact to the transistor source and drain ("contact holes")
chemical reaction: WF₆ + 3H₂ → W + 6HF

1. Theory of gas kinetics
2. Plasma
3. Principle of Chemical Vapor Deposition
4. Types of CVD

pages: previous | 1 2 3 4 5 6 [7]