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Chemical Vapor Deposition tutorial

Modules

1. Theory of gas kinetics
2. Plasma
3. Principle of Chemical Vapor Deposition
4. Types of CVD

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CVD with TEOS

  • A carrier gas N2 passes through the bubbling TEOS (tetra-ethyl-ortho-silicate - see the picture for chemical composition) and then it reaches the reactor
  • A film with excellent conformality can be obtained
  • It is actually a decomposition process, not a chemical reaction (C2H5 groups are removed and SiO2 remains - see picture below)
  • It can also react with ozone:

                               Si(C2H5O)4 + 8O3 →SiO2 + 10H2O +8CO2

                       

1. Theory of gas kinetics
2. Plasma
3. Principle of Chemical Vapor Deposition
4. Types of CVD

pages: previous | 1 2 3 [4] 5 6 7 | next

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