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Chemical Vapor Deposition tutorial

Modules

1. Theory of gas kinetics
2. Plasma
3. Principle of Chemical Vapor Deposition
4. Types of CVD

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PUMPS

 

                               

In the picture is shown a turbomolceular pump placed on a mechanical pump. The turbomolecular pump is connected to the reaction chamber, but it requires also a mechanical pump. The turbomolecular can create very low pressures, but it cannot pump at atmospheric pressure, thus it requires a lower end pressure, which is insured by the mechanical pump. This combination is frequently used in Clean Rooms.

 

There are two types of pumps:

  • pumps that physically remove the molecules from the chamber:
    • mechanical pump (from 1 atm to 1 mTorrs) - it captures the gas, compresses it and expulses it outside; problems with oil contamination (oil is used for the moving parts, but it is not desired in a reaction chamber)
    • turbomolecular pump (from 100 mTorr to 10-9 Torr) - transfers momentum from spinning turbines (very high speed -100000 rpm) to gas particles and the particles are easier removed
    • oil diffusion pump (from 100 mTorr to 10-9 Torr) - transfers momentum from a jet of hot vapor oil to gas particles
  • pumps that adsorb the molecules on a surface
    • cryopump (from 0.1 mTorr to 10-11 Torr) - molecules condense on a very cold surface (cooled with liquid He); when the surface is full, it is removed from the chamer and heated to let the gas particles evaporate

1. Theory of gas kinetics
2. Plasma
3. Principle of Chemical Vapor Deposition
4. Types of CVD

pages: previous | 1 2 [3]

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