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Chemical Vapor Deposition tutorial

Modules

1. Theory of gas kinetics
2. Plasma
3. Principle of Chemical Vapor Deposition
4. Types of CVD

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GAS FLOW in a reaction chamber

       

  • The gas flow is given not in volume per time, but in number per time, or concentration of molecules in the chamber
    •  due to the fact that gasses are compressible (volume is not constant), unlike liquid
  • On average the flow will move from high to low pressure, to reduce the pressure gradient

  • The pressure gradient is created by introducing gas in a chamber and pumping out the gas (see picture below)
  • A part of the gas molecules will diffuse toward the substrate and react at the surface

           

  • The throughput (which enters the chamber) can be defined as the product between pressure and volume divided by time: Q = (pV)/time
    • because there is a relation between concentration,  volume and pressure (pV = NkBT), thus the gas flow (N/time) is proportional with the throughput 
  • Another parameter that characterises  the vacuum system is volumetric flow or pumping speed        
    • it is defined as the variation of volume in time
    • it is measured in standard cubic centimeters per minute (sccm) = the volume of gas at 1 atm and 273 K (standard conditions)
    • it is equal to the throughput divided by pressure
    • it is the most widely used parameter to define the flow passing through the reactor, at a certain pressure
    • it defines also the pump capacity to maintain a certain pressure for a given gas flow
  • The conductance of a pipe (or a vacuum component) connecting the chamber to the pump (pipes reduces the capacity of pumping) is defined as:, therefore the pipes should be short and with a large diameter, so that the gas can be efficiently pumped
  • Knudsen number gives information about the type of flow:  (defined as the ratio between mean free path and reactor's length)
    • Kn > 1 - Molecular flow (if the mean free path is larger than the reactor dimensions, the molecules do not collide at all before meeting the walls, and the gas behaves like a sum of molecules, instead of a fluid)
      • for low pressures (~ 1mTorr)
      • pumps are important to create these low pressures
    • 1 > Kn > 0.01 - Intermediate flow
    • 0.01 > Kn -  Viscuous flow (if the mean free path is much smaller than the reactor dimensions, a huge number of collisions take place and the gas behaves as a fluid)

1. Theory of gas kinetics
2. Plasma
3. Principle of Chemical Vapor Deposition
4. Types of CVD

pages: previous | 1 [2] 3 | next

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