IPCI logo
Internet-based Performance Centred Instruction
Chemical Vapor Deposition tutorial

Modules

1. Theory of gas kinetics
2. Plasma
3. Principle of Chemical Vapor Deposition
4. Types of CVD

pages: previous | 1 [2] 3 4 5 6 | next

REACTIONS

Here are a few types of reactions that can take place in a CVD reactor:

  • Pyrolosis: a compound dissociates (breaks bonds, or decomposes) with the application of heat

                   SiH4(g) → Si(s) +2H2(g) (650oC)

 

  • Reduction: a chemical reaction occurs by reacting a molecule with hydrogen

                   SiCl4(g) + 2H2(g) → Si(s) +4HCl(g) (1200oC)

 

  • Oxidation: a chemical reaction of an atom or molecule with oxygen

                  SiH4(g) + O2(g) → SiO2(s) +2H2(g) (450oC)

 

  • Reduction-oxidation (redox): a combination of reactions 3 and 4 with the formation of two new compounds

                SiCl4(g) + CH4(g) → SiC(s) +4HCl(g) (1400oC)

 

1. Theory of gas kinetics
2. Plasma
3. Principle of Chemical Vapor Deposition
4. Types of CVD

pages: previous | 1 [2] 3 4 5 6 | next

go to top