:: IPCI ::

Projection EBL (SCALPEL)
- Direct writing is too slow → thus it was replaced by projection writing
- Mask is a problem for EBL → thin membranes are required to reduce absorption
- Scattering material with high Z are used to block the electron beam in desired regions, membrane is made of low Z material
- Magnetic lenses are used instead of optical ones (the beam of electrons, not photons) to reduce the design from the mask to the wafer
- An aperture is placed in the focal plane to block the scattered electrons
- Main problems: stitching structures (two areas obtained in 2 different steps), masks fabrication

Applications of e-beam litho
- High resolution: 0.1 microns
- Low througput
- Applications: masks, test die, research