My Courses:
Techonolgy of microelectronic devices
Substrate preparation
Film deposition
Modifying the film properties
Lithography
Tutorials
(
2
)
Photolithography
Advanced lithography
Etching
Fabricating devices
Photolithography
tutorial
Modules
1.
Optical sources
2. Photoresists
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Post-exposure bake
Completely
remove the solvent
before developing
Temperature of hot plate
= 110 -120
o
C
Develop
- the resist is removed by the developer in the exposed/unexposed regions for positive/negative lithography
3 methods:
Puddle
(as applying the photoresist) and rinsing with water
Spraying
the developer + water rinse
Immersing
the substrate in developer + water rinse (as shown in the picture below)
1.
Optical sources
2. Photoresists
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Substrate preparation
