Nanoimprint lithography

• a mold is used to create trenches in the resist, by pressing it
• after the mold is removed, anisotropic etching is used to remove the residue resist in the shallow regions
• the process is continued by depositing Ti/Au over the made structure, then by lift-off the resist is removed and metalic dots will remain in the regions where the resist was etched
• 10 nm dots can be made - very high resolution

Other methods are:

• Moulding
• Laser interference lithography
• Phase-shift lithography